Fluorine is removed from its solution as a result of precipitation of fluorine ion as sodium fluorosilicate
Water treatment
Adsorption & desorption of fluorine
improve global environment for next generation Porous Alpha
improve global environment for next generation Porous Alpha
Adsorption & desorption of fluorine
Semiconductor manufacturer
uses fluoric fluid to clean silicon wafers
Glass manufacturer and processor
uses fluoric fluid as material for etching
Liquid crystal display manufacturer
use fluoric fluid for etching glass
Metal processing company
use fluoric fluid for pickling
Coal thermal power plant
discharge waters with fluorine from desulfurization system
Regulation of discharge of fluorine (8mg/l) must be followed
Existing solution requires a lot of cost
Porous Alpha can reduce the cost of fluorine water treatment.
Our technology “Fluorine adsorption agent and fluorine-containing water treatment” is patented.
Specific surface area：83m2 g-1
Specific surface area : 278m2 g-1
Fluorine is removed from its solution as a result of precipitation of fluorine ion as sodium fluorosilicate
Sodium fluorosilicate is valuable as a law material for hydrofluoric acid
Fluorine adsorption and desorption process could be implemented in a simple manner with Porous Alpha
In addition to above, simple plant structure can realize small size of initial investment
Currently they’re using the combination of precipitation method with calcium and aluminum to remove fluorine.They have intention to use our technology to reduce the discharging cost of industrial waste (sludge)
・Minimum contact time: 1hour
・Fluorine adsorption capacity per 1g of Porous Alpha: 400mg
– In case of high concentration of fluorine, the adsorption process should be repeated
・Required quantity of Porous Alpha per 1 step: 5% of quantity of fluid
・Concentration of fluorine after adsorption process: less than 8ppm
– Not guaranteeing to decrease the concentration to 0.8 ppm (for potable water)
・The purity of precipitation on sodium fluorosilicate is decreased according to the concentration of Fe (III) and Al(III)
・Technical issues to be solved
– The fluoric water discharged from glass etching contains boron. As a water treatment solution, the removal of BF4 is also required. Now we are developing to remove the boron alongside with fluorine.
– To provide as a system for water treatment of fluoric discharging water, it is required to remove boron at the same time
– Methodology to remove boron is now under investigation.
